Effects of different valence atoms on surface passivation of silicon carbide nanowires

Author:

Ma Wan-Duo1,Liu Wei-Kai1,Gong Pei1,Jia Ya-Hui1,Yang Ying-Ying1,Fang Xiao-Yong1ORCID

Affiliation:

1. Key Laboratory for Microstructural Material Physics of Hebei Province, School of Science, Yanshan University, Qinhuangdao 066004, P. R. China

Abstract

In this paper, based on the first principles, we study the properties of silicon carbide nanowires (SiCNWs) passivated by monovalent hydrogen (H), heptavalent fluorine (F) and chlorine (Cl) atoms at the electronic level to reveal the mechanism of interaction between different valence electrons in the passivation process. The results show that the passivation can improve the inhomogeneity of the surface and internal Si–C bonds, and improve the stability of the SiCNWs structure. The structure of F-SiCNWs is the most stable. Meanwhile, passivation increases the bandgap of the SiCNWs, and the bandgap of H, F and Cl passivation SiCNWs decreases successively, this is because the potential energy of H-1s, F-2p and Cl-3p interacting with Si-3p decreases in turn. Besides, heptavalent F and Cl passivation can regulate some optical properties of the SiCNWs to the deep-ultraviolet light regions such as absorption, conductivity, refractive index and loss function. Monovalent H passivation can regulate some optical properties of the SiCNWs to the vacuum ultraviolet light region (UVD). These studies have potential application value for the development of deep-ultraviolet micro–nano devices.

Funder

National Natural Science Foundation of China

Natural Science Foundation of Hebei Province

Publisher

World Scientific Pub Co Pte Lt

Subject

Condensed Matter Physics,Statistical and Nonlinear Physics

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