STRUCTURAL AND OPTICAL PROPERTIES OF γ-MO2N THIN FILMS DEPOSITED BY DC REACTIVE MAGNETRON SPUTTERING-Reference-Cited by-同舟云学术

STRUCTURAL AND OPTICAL PROPERTIES OF γ-MO2N THIN FILMS DEPOSITED BY DC REACTIVE MAGNETRON SPUTTERING

Published:2009-09-20 Issue:23 Volume:23 Page:4817-4823
ISSN:0217-9792
Container-title:International Journal of Modern Physics B
language:en
Short-container-title:Int. J. Mod. Phys. B

Author:

ATUCHIN V. V.¹,KHASANOV T.¹,KOCHUBEY V. A.¹,POKROVSKY L. D.¹,GAVRILOVA T. A.²

Affiliation:

1. Laboratory of Optical Materials and Structures, Institute of Semiconductor Physics, SB RAS, Novosibirsk 90, 630090, Russia

2. Laboratory of Nanodiagnostics and Nanolithography, Institute of Semiconductor Physics, SB RAS, Novosibirsk 90, 630090, Russia

Abstract

Molybdenum nitride films γ- Mo 2 N/Si have been fabricated with reactive magnetron sputtering in ( N 2 + Ar ) gas mixture. Phase composition of the films has been defined with reflection high energy electron diffraction. Refractive index and extinction coefficient of γ- Mo 2 N have been evaluated with laser ellipsometry at λ = 632.8 and 488.0 nm. Upper limit of γ- Mo 2 N film thickness measurable with laser ellipsometry has been found to be ~80 nm.

Publisher

World Scientific Pub Co Pte Lt

Subject

Condensed Matter Physics,Statistical and Nonlinear Physics

Link

https://www.worldscientific.com/doi/pdf/10.1142/S0217979209053813

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