Combined D-optimal design and generalized regression neural network for modeling of plasma etching rate
Author:
Publisher
EDP Sciences
Subject
Safety, Risk, Reliability and Quality
Link
http://www.metrology-journal.org/10.1051/ijmqe/2014005/pdf
Reference13 articles.
1. H. Ramakrishnan et al., Analysing the effect of process variation to reduce parametric yield loss,IEEE International Conference on Integrated Circuit Design and Technology and Tutorial, ICICDT. Austin, TX, USA, 2008
2. Design of experimental optimization for ULSI CMP process applications
3. Applications of Taguchi and design of experiments methods in optimization of chemical mechanical polishing process parameters
4. Z.N. Mevawalla, G.S. May, M.W. Kiehlbauch, Neural networks for advanced process control, inAdvanced Semiconductor Manufacturing Conference (ASMC), IEEE/SEMI, San Francisco, CA, USA, 2010
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