Rapid crystallization of amorphous silicon utilizing a VHF plasma annealing at atmospheric pressure
Author:
Publisher
EDP Sciences
Subject
Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials
Link
http://www.epjap.org/10.1051/epjap:2007025/pdf
Reference25 articles.
1. Capless rapid thermal annealing of GaAs using an enhanced overpressure proximity technique
2. XeCl Excimer Laser Annealing Used to Fabricate Poly-Si TFT's
3. Metal-induced crystallization of amorphous silicon
4. Poly-Si thin-film transistors on steel substrates
5. Deposition of high crystallinity poly-Si films on glass substrate and fabrication of high mobility bottom-gate TFT
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