Advanced backside sample preparation for multi-technique surface analysis-Reference-Cited by-同舟云学术

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Advanced backside sample preparation for multi-technique surface analysis

Published:2011-08-18 Issue:3 Volume:55 Page:31001
ISSN:1286-0042
Container-title:The European Physical Journal Applied Physics
language:
Short-container-title:Eur. Phys. J. Appl. Phys.

Author:

Py M.,Veillerot M.,Fabbri J.M.,Pierre F.,Jalabert D.,Roukoss C.,Pelissier B.,Boujamaa R.,Trouiller C.,Barnes J.P.

Publisher

EDP Sciences

Subject

Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://epjap.epj.org/10.1051/epjap/2011110191/pdf

Reference15 articles.

1. Backside and frontside depth profiling of B delta doping, at low energy, using new and previous magnetic SIMS instruments

2. Backside-SIMS profiling of dopants in thin Hf silicate film

3. Accurate depth profiling for ultra-shallow implants using backside-SIMS

4. Depth profiles of boron and nitrogen in SiON films by backside SIMS

5. Characterizing high-k and low-k dielectric materials for semiconductors: Progress and challenges

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Bibliography;Swift Ion Beam Analysis in Nanosciences;2017-08-25

2. Study of the La-related dipole in TiN/LaOx/HfSiON/SiON/Si gate stacks using hard X-ray photoelectron spectroscopy and backside medium energy ion scattering;Applied Surface Science;2015-04

3. Backside medium energy ion scattering study of the lanthanum diffusion in advanced gate stacks for the 32nm node;Microelectronic Engineering;2013-11

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