Author:
Käseberg Tim,Grundmann Jana,Dickmann Johannes,Kroker Stefanie,Bodermann Bernd
Abstract
We designed, realized, and characterised an imaging Mueller matrix ellipsometry setup for the pixelwise measurement of the Mueller matrices in microscope images. Our setup is capable of performing measurements in reflection as well as in transmission in a broad range of angles of incidence for wavelengths between 400 nm and 700 nm. We compared measurements of specially designed nanostructured samples with AFM and SEM measurements as well as with numerical simulations using the finite element method.
Reference6 articles.
1. Losurdo M., Hingerl K., Ellipsometry at the Nanoscale (Springer, Berlin, 2013)
2. Perspective: Optical measurement of feature dimensions and shapes by scatterometry
3. Kerwien N., On the influence of polarization effects in microscopic image formation, Berichte aus dem Insitut für Technische Optik 58 (2007)
4. Käseberg T., Siefke T., Kroker S., Bodermann B., Meas. Sci. Technol. (manuscript accepted), https://doi.org/10.1088/1361-6501/ab7e6b
Cited by
3 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献