Quantification de l'analyse en profondeur par spectrométrie d'électrons Auger et pulvérisation ionique : caractérisation des interfaces des films multicouches Cu

Quantification de l'analyse en profondeur par spectrométrie d'électrons Auger et pulvérisation ionique : caractérisation des interfaces des films multicouches Cu–Co

Published:1997 Issue:4-5 Volume:8 Page:301-314
ISSN:1154-2799
Container-title:Microscopy Microanalysis Microstructures
language:
Short-container-title:Microsc. Microanal. Microstruct.

Author:

Basile Françoise,Bergner Jean,Bombart Claude,Nallet Pascale,Chassaing Elisabeth,Lorang Gérard

Publisher

EDP Sciences

Subject

Instrumentation

Link

http://mmm.edpsciences.org/10.1051/mmm:1997123/pdf

Reference38 articles.

1. Auger electron spectroscopy depth profiling of Ni/Cr multilayers by sputtering with N2+ ions

2. The ultra-high resolution depth profiling reference material — Ta2O5 anodically grown on Ta

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