Dynamic Bias-Temperature Instability Testing in SiC MOSFETs

Author:

Martino Edoardo1ORCID,Kicin Slavo1,Zong Yuan1,Nasralla Ahmad1,Romano Gianpaolo2,Burkart Ralph1,Mesemanolis Athanasios2,Wirths Stephan1

Affiliation:

1. Hitachi Energy Research

2. Hitachi Energy

Abstract

For power converter development in mission critical applications, the attractive performances of SiC power MOSFETs are shadowed by reliability concerns, particularly those induced by the defects at the gate dielectric. Charge trapping at the oxide-semiconductor interface can lead to threshold voltage drift, degrading the power converter efficiency and lifetime. The scope of this contribution is to show a testing methodology under development to understand SiC power MOSFET threshold voltage stability under dynamic and accelerated operating conditions. The presented testing methodology relies on switching the device under test at high-voltage and current, simultaneously applying a gate stress and extracting threshold voltage from switching transients. The paper outlines the setup description, its operating modes and intended design of experiment to assess SiC MOSFET threshold voltage stability.

Publisher

Trans Tech Publications, Ltd.

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