The Use of Trimethylaluminum for Producing Surface Layers by the PACVD Method

Abstract

The paper presents the use of trimethylaluminum in PACVD method to obtain the surface layers like alumina or aluminum nitride on Inconel nickel alloy. The glow discharge nitriding at a temperature of 750°C leads to the formation of aluminum oxynitride in the layer, whereas annealing in argon plasma at a temperature of 1050°C – to the formation of nickel and aluminum based intermetallic phases of the NiAl or Ni3Al type with aluminum oxide present within the outer zone of the coating. The presence of the surface layer of the Al2O3+NiAl+Ni3Al type formed on nickel alloys may be significant from the point of view of the applications that require a high heat resistance.