Precursor design and selective aluminum CVD
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference24 articles.
1. 1982 Symp on VLSI Tech;Ito,1982
2. Characterization of LPCVD Aluminum for VLSI Processing
3. Aluminum selective area deposition on Si using diethylaluminumchloride
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