Properties of High-Density Amorphous Carbon Films Deposited by Laser Ablation
Author:
Affiliation:
1. Hungarian Academy of Sciences
2. Hungarian Academy of Sciences, Centre for Energy Research
3. Budapest University of Technology and Economics
4. MTA Research Institute for Technical Physics and Materials Science
Publisher
Trans Tech Publications, Ltd.
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Link
https://www.scientific.net/MSF.414-415.127.pdf
Reference17 articles.
1. H.J. Scheibe, P. Siemroth, B. Schöneich, A. Mucha: Diamond Relat. Mater. 1, 98 (1992).
2. E. Pascual, C. Serra, J. Esteve, E. Bertran: Surf. Coat. Technol. 47, 263 (1991).
3. O. Stenzel, G. Schaarschmidt, M. Vogel, R. Petrich, F. Wolf, T. Wallendorf, F. Scholze, W. Scharff: Diamond Relat. Mater. 1, 98 (1992).
4. A.J. White, W.I. Milne: Diamond Relat. Mater. 2, 255 (1993).
5. J.J. Cuomo, D.L. Pappas, J. Bruley, J.P. Doyle, K.L. Saenger: J. Appl. Phys. 70, 1706 (1991).
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