Vertical Etching of Ru Electrodes Using the O<sub>2</sub>/Cl<sub>2</sub> System-Reference-Cited by-同舟云学术

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Vertical Etching of Ru Electrodes Using the O₂/Cl₂ System

Published:2004-03 Issue: Volume:449-452 Page:357-360
ISSN:1662-9752
Container-title:Materials Science Forum
language:
Short-container-title:MSF

Author:

Kim Hyoun Woo¹

Affiliation:

1. Inha University

Abstract

In this study, the etching characteristics of ruthenium (Ru) electrode using O2/Cl2helicon plasmas were investigated. The variation of Ru etch rate, Ru to SiO2etch selectivity and Ru etching slope with varied process variables were scrutinized. Not only the gas chemistry affected the Ru etching, but also the higher bias power and argon (Ar) bombardment helped to faciliate the Ru etching.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Link

https://www.scientific.net/MSF.449-452.357.pdf

Reference10 articles.

1. S. Yamamichi, P. -Y. Lesaicherre, H. Yamaguchi, K. Takemura, S. Sone, H. Yabuta, K. Sato, T. Tamura, K. Nakajima, S. Ohnishi, K. Tokashiki, Y. Hayashi, Y. Kato, Y. Miyasaka, M. Yoshida and H. Ono: IEDM Tech. Digest (1995), p.119.

2. A. Yuuki, M. Yamamuka, T. Makita, T. Horikawa, T. Shibano, N. Hirano, H. Maeda, N. Mikami, K. Ono, H. Ogata and H. Abe: IEDM Tech. Digest (1995), p.115.

3. B. T. Lee, K. H. Lee, C. S. Hwang, W. D. Kim, H. Horii, H. -W. Kim, H. -J. Cho, C. S. Kang, J. H. Chung, S. I. Lee and M. Y. Lee: IEDM Tech. Digest (1997), p.249.

4. T. Aoyama, S. Yamazaki and K. Imai: J. Electrochem. Soc. Vol. 145 (1998), p.2961.

5. W. J. Yoo, J. H, Hahm, H. W. Kim, C. O. Jung, Y. B. Koh and M. Y. Lee: Jpn. J. Appl. Phys. Vol. 35 (1995), p.2501.

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