Influence of Process Parameters on the Properties of TiO2 Films Deposited by a D.C. Magnetron Sputtering System on Glass Support

Author:

Toma Stefan Lucian1,Bejinariu Costica1,Lucian Eva2,Sandu Ioan Gabriel3,Toma Bogdan Florin4

Affiliation:

1. Technical University “Gh. Asachi"

2. Clinical Emergency Hospitals “Prof. Dr. Nicolae. Oblu”

3. ‘‘Gheorghe Asachi’’ Technical University of Iasi

4. University of Medicine & Pharmacy “Gr. T Popa”

Abstract

In this paper it has been deposited films of titanium oxide (TiO2), on a support of glass, by a D.C. magnetron sputtering system, by varying the working pressure (p = 2∙10-3 - 6.5∙10-3mbar) of the substrate temperature on three levels. The obtained layers were investigated and characterized by optical microscopy, Scanning Electron Microscopy SEM, X-ray diffraction and Atomic Force Microscopy. It was observed that, by modifying technological parameters of the process (working pressure and substrate temperature) it is changing the initial orientation of the compounds ((100) turns into (101) or (002)). The AFM analysis has allowed the observation of the fact that the average roughness of deposited films, expressed as RMS, has increased over 98% at the increasing of sputtering pressure from 2 10-3mbar to 6.5 10-3mbar. SEM analysis showed that the density of the deposit increases with substrate temperature. The granulation of the films obtained, presents an increasing trend with the variation of process parameters.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

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