Morphological and Magnetic Properties of Co100-xCux Film Prepared by RF-Sputtering

Abstract

Granular Co100-xCux films with different compositions of x = 19, 40, 54, 65 and 76 were deposited on glass substrates using sputter deposition. Co (HCP) and Cu (FCC) phases were observed in all deposited Co-Cu films. Film thickness was increased with increasing Cu-composition. The minimum and maximum values of electrical resistance measured using a four-point probe were observed on the Co24Cu76 and Co46Cu54 films, respectively, which confirmed that the electrical property of the films is a function of the film thickness and composition. The morphological and magnetic properties of all deposited films were clearly dependent on film composition. The AFM result confirmed the dependence of surface morphology and magnetic properties on the film composition because of the difference in the deposition rate between Co and Cu atoms during the sputtering process. The VSM results showed that all films had a ferromagnetic phase when the magnetic field was applied perpendicular to the film plane. All results confirmed that the desired morphological, electrical and magnetic properties of Co-Cu granular film can be achieved by manipulating its chemical composition.