Affiliation:
1. National Cheng Kung University
2. Metallurgy Section, Materials and Electro-Optics Research Division
Abstract
Ni-Co thin films were prepared on glass substrate by RF magnetron sputtering technique. Post-deposition annealing of Ni-Co film in oxygen atmosphere was found to improve film structure and electrical characteristics. The correlation between annealing conditions and the physical structure of the films was investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM) and UV-Vis-NIR spectrophotometer. The lowest resistivity was observed after annealing a sputter-deposited Ni-Co film at 600 °C for 5h. The transmittance showed more than 85% in the infrared range. The preferred annealing condition has been found to improve Ni-Co film characteristics for transparent conducting material applications.Keywords: Ni-Co film, annealing, phase transition
Publisher
Trans Tech Publications Ltd
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