Verification of Theoretical Model for Tunneling Currents in Al/SiO2/p-Si MOS Capacitors with Nanometer-Thick Oxides

Author:

Mulyanti Budi1,Hasanah Lilik1,Pantjawati Arjuni B.1,Murakami Hideki2,Khairurrijal 3

Affiliation:

1. Indonesia University of Education (UPI)

2. Hiroshima University

3. Institut Teknologi Bandung

Abstract

The verification of calculation results of the isotropic and anisotropic-isotropic mass models in Al/SiO2/Si MOS capacitor against the experimental data is presented, using electron transversal velocity as a fitting parameter. In the accumulation condition, the comparison yields the electron velocity of 2.8 x 106m/s for both isotropic and isotropic-anisotropic mass models. The tunneling current values for both models are slighly different with experimental data. In the inversion condition, the values of electron velocity for isotropic and isotropic-anisotropic model are 1.55 x 106m/s and 1 x 105m/s, respectively. The calculation results of isotropic-anisotropic mass model appear to be closer to the experimental data compared to those of isotropic mass model, due to the effect of electron effective mass.

Publisher

Trans Tech Publications, Ltd.

Subject

General Engineering

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