Reliability Performance of 1200 V and 1700 V 4H-SiC DMOSFETs for Next Generation Power Conversion Applications

Author:

Gajewski Donald A.1,Ryu Sei Hyung1,Das Mrinal1,Hull Brett1,Young Jonathan1,Palmour John W.1

Affiliation:

1. Cree Incorporation

Abstract

We present new reliability results on the Cree, Inc., 4H-SiC, DMOSFET devices. The Cree DMOSFETs were developed to meet the demand of next-generation, high-frequency power switching applications, such as: dc-ac inversion, dc-dc conversion, and ac-dc rectification, with continually improving energy efficiency. The Cree Generation 2 DMOSFET process technology is now commercially available with 1200 V and 1700 V ratings. We have performed intrinsic reliability studies to ensure excellent wear-out performance and long field lifetime of the products. We have also performed large sample size qualification reliability acceptance tests to ensure the quality of the manufacturing and packaging processes. These comprehensive reliability studies establish new benchmarks for wide bandgap transistors and demonstrate that Crees MOSFETs meet or exceed all industrial reliability requirements. This achievement facilitates broad market adoption of this disruptive power switch technology.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference8 articles.

1. [75] [75] HTGS VGS = 20 V, 20 kHz square wave 50% duty cycle, VDS = 0, 150 °C 1000 hours.

2. [75] [75] H3TRB.

3. °C, 85% RH, VDS = 100 V, VGS = 0 1000 hours.

4. [75] [75] HTRB 150 °C, VDS = 960 V, VGS = 0 1000 hours.

5. 231 231 TC -55 °C / 150 °C, JESD22-A104 condition H, soak mode 1 1000 cycles.

Cited by 12 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Reliability under High Gate-Voltage Condition on SiC MOSFET Through Repeated Overcurrent;2024 IEEE 10th International Power Electronics and Motion Control Conference (IPEMC2024-ECCE Asia);2024-05-17

2. Effect of Particle Size Distribution, pH, and Na+ Concentration on the Chemical Mechanical Polishing of Sapphire and 4H-SiC (0001);ECS Journal of Solid State Science and Technology;2022-04-01

3. Negative Gate Bias TDDB evaluation of n-Channel SiC Vertical Power MOSFETs;2022 IEEE International Reliability Physics Symposium (IRPS);2022-03

4. TDDB Lifetime Enhancement in SiC-MOSFETs under Gate-Switching Pperation;Materials Science Forum;2020-07

5. SiC MOSFETs robustness for diode-less applications;EPE Journal;2018-04-02

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3