Reflectometry Studies of Mesoporous Silica Thin Films
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Published:2008-02
Issue:
Volume:135
Page:31-34
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ISSN:1662-9779
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Container-title:Solid State Phenomena
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language:
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Short-container-title:SSP
Author:
Hwang Young Kyu1, Mamman Ajit Singh1, Patil K. R.1, Kim Lee Kyung2, Hwang Jin Soo1, Chang Jong San1
Affiliation:
1. Korea Research Institute of Chemical Technology (KRICT) 2. Korea Materials & Analysis Corporation
Abstract
Reflectometry technique has been successfully applied to investigate the correlation between the porosity and optical property (refractive index) of the ordered mesoporous thin film deposited on silicon wafer substrates. The measured optical spectra were simulated by the Effective Medium approximation model. The reflectometry technique has been found to be appropriate for the measurement of thickness of thin films as well as thick layer films. The mesoporous silica films prepared from tri-block copolymer (F-127) as a surfactant and polypropylene oxide as a swelling agent were subsequently exposed to the ammonia vapors to enhance thermal stability and shrinkage minimization of the film that results in increased film thickness.
Publisher
Trans Tech Publications, Ltd.
Subject
Condensed Matter Physics,General Materials Science,Atomic and Molecular Physics, and Optics
Reference17 articles.
1. (a) Chen, F. L., Liu, M. L., Chem. Commun., 1829 (1999), 2. (b) Miller, R. D., Science, 286, (1999) 421. 3. (a) Mate, C. M., Lorenz, M. R., Novotny, V. J., J. Chem. Phys., 90 (1989). 4. (a) R. S. Balmer, C. Pickering, A. J. Pidduck, T. Martin, J. Crystal Growth, 245 (2002). 5. J. Rodriguez, M. Gomez, J. Ederth, G. A. Niklasson, C. G. Granqvist, Thin Solid Films, 365 (2000) 119. (b) B. Muller, M. Jager, Y, Tao, A. Kundig, C. Cai, C. Bosshard, P. Gunter, Optical Materials 12 (1999) 345.
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