Hydrogen-Related Donors in Silicon: Centers with Negative Electronic Correlation Energy

Author:

Pokotilo Yurii M.1,Petukh Alla N.1,Litvinov Valentin V.2,Tsvirko B.G.

Affiliation:

1. Belarusian State University

2. State University of Belarus

Abstract

The transformation of the shallow hydrogen-related donors, which have been formed in the silicon samples by irradiation of the low energy (300 keV) protons and following heat treatment under 350 0С or 450 0С was investigated. The experiment was carried out on Ag-Mo-Si Shottky diodes and diodes with shallow p+-n-junction. The concentration and distribution of these donors were defined by C-V-method at 1.2 MHz frequency. Using temperature dependence of equilibrium electron concentration it was established, that the hydrogen-related donors were charged controlled centers with negative electronic correlation energy (U<0). The transformation between both equilibrium configurations of the double hydrogen-related donor takes place when value of the Fermi level is arranged near Ec-0.30 eV. It was revealed that the donor transformation from neutral into double charged state have been stimulated by minority carriers trapping under room temperature when Fermi level was higher then level of the double electron occupation E(0/++)= Ec-0.30 eV.

Publisher

Trans Tech Publications, Ltd.

Subject

Condensed Matter Physics,General Materials Science,Atomic and Molecular Physics, and Optics

Reference14 articles.

1. Y. Ohmura, Y. Zohta and M. Kanazawa: Phys. Stat. Sol. (a) Vol. 15(1973), p.93.

2. Yu.V. Gorelkinskii, V.O. Sigle and Zh.S. Takibaev: Phys. Stat. Sol. (a) Vol. 22(1974), p.55.

3. V.V. Kozlovskii: Modifitsirovanie Poluprovodnikov Puchkami Protonov (Nauka, S. Peterburg 2003).

4. Kh.A. Abdullin, Yu.V. Gorelkinskii and B.N. Mukashev: FTP Vol. 36(2002), p.257.

5. Yu.V. Gotelkinskii, and N.N. Nevinnyi: Nucl. Institut and Meth Vol. 209(1983), p.677.

Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Electrically active defects induced by hydrogen and helium implantations in Ge;Materials Science in Semiconductor Processing;2008-10

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3