Activated He:H<sub>2</sub> Strip of Photoresist over Porous Low-k Materials-Reference-Cited by-同舟云学术

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Activated He:H₂ Strip of Photoresist over Porous Low-k Materials

Published:2005-04 Issue: Volume:103-104 Page:341-344
ISSN:1662-9779
Container-title:Solid State Phenomena
language:
Short-container-title:SSP

Author:

Han Qing Yuan¹,White Brian,Berry Ivan L.²,Waldfried Carlo¹,Escorcia O.²

Affiliation:

1. Axcelis Technologies, Inc.

2. Axcelis Technologies Inc.

Publisher

Trans Tech Publications, Ltd.

Subject

Condensed Matter Physics,General Materials Science,Atomic and Molecular Physics, and Optics

Link

https://www.scientific.net/SSP.103-104.341.pdf

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