Exploring Thin-Film Reactions by Means of Simultaneous X-Ray Surface Roughness and Resistance Measurements-Reference-Cited by-同舟云学术

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Exploring Thin-Film Reactions by Means of Simultaneous X-Ray Surface Roughness and Resistance Measurements

Published:2001-04 Issue: Volume:194-199 Page:1477-1490
ISSN:1662-9507
Container-title:Defect and Diffusion Forum
language:
Short-container-title:DDF

Author:

Lavoie C.¹,Cabral C.²,d'Heurle François M.²,Harper J.M.E.²

Affiliation:

1. Northrop Grumman Electronic Systems

2. IBM Research Division

Publisher

Trans Tech Publications, Ltd.

Subject

Condensed Matter Physics,General Materials Science,Radiation

Link

https://www.scientific.net/DDF.194-199.1477.pdf

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