Influence of a Pulsed Electron Beam on the Sowing Quality of Wheat

Abstract

Wheat grain has been irradiated by 200 keV and 305 keV of pulsed electron beams for changing of sowing parameters. Total microbial number, germination and germination energy were compared for both of electron kinetic energy settings for the same ranges of the energy input. The electron beam of 305 keV showed better disinfecting effect for energy input values of less than 4 J/g. That mode eliminates seed germination ability after irradiation of more than 2 J/g and can be used for grain storing. The mode of 200 keV beam keeps seed germination ability up to 5 J/g with the similar disinfecting effect after the irradiation energy input of more than 4 J/g. This mode can be used for pre-sowing seed treatment procedure.