Nano Structures Constructed by AFM Based Lithography

Abstract

Scanning probe lithography such as atom force microscopy (AFM) has the highest spatial resolution. SPM etching technique employed conductive SPM probe as cathode and metal or semiconductor surface as anode. This paper reports the construction of nanopatterns by conductive nanoetching method on HDT modified Au (111) surface. With Pt-plated probe tip, nanowires of a minimum width of 176 nm was fabricated. The study shows that AFM lithography could be an alternative technology to e-beam lithography and focused-ion-beam.