Production and Annealing of Defects in Proton-Irradiated n-Ge
Author:
Affiliation:
1. Russian Academy of Sciences
2. Leibniz Institute for Crystal Growth
3. St. Petersburg State Polytechnical University
Abstract
Publisher
Trans Tech Publications, Ltd.
Subject
Condensed Matter Physics,General Materials Science,Atomic and Molecular Physics, and Optics
Link
https://www.scientific.net/SSP.205-206.422.pdf
Reference6 articles.
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2. V.P. Markevich, S. Bernardini, I.D. Hawkins, A.R. Peaker, V.I. Kolkovsky, A. Nylandsted Larsen, L. Dobaczewski, Electrically active defects induced by hydrogen and helium implantation in Ge, Mat. Sci. in Semicond. Processing 11 (2008) 354-359.
3. J.S. Blakemore, Semiconductor Statistics, Pergamon Press, New York, (1962).
4. V.V. Emtsev, R.L. Korchashkina, T.V. Mashovets, Vacancy-donor complexes in g-irradiated phosphorus-doped germanium, Phys. Stat. Sol. (a) 10 (1972) 43-48.
5. N.A. Vitovskii, D. Mustafakulov, A.P. Chekmareva, Sov. Phys. Semicond. Threshold energy for the displacement of atoms in semiconductors (in Russian) (English Translation by AIP) 11 (1977) 1024-1028.
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