Affiliation:
1. ST Microelectronics Crolles2
Abstract
Wet etchant infiltration through photo sensitive resists have been studied with new methodology. This latter enables a very quick response to select wet etchant / polymer compatibility to protect underneath film from being degraded.
Publisher
Trans Tech Publications, Ltd.
Subject
Condensed Matter Physics,General Materials Science,Atomic and Molecular Physics, and Optics
Cited by
2 articles.
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