Affiliation:
1. National Research University of Electronic Technology
Abstract
Abstract. Metal-assisted silicon etching in the HF/H2O2/H2O solution with silver ions as a catalyst was investigated. It is found that geometric parameters of layers of nanostructured silicon are determined by the silver-catalyst concentration. A spontaneous stop of the etching process at low Ag+ ion concentration is explained by formation of insoluble Ag2SiO3.
Publisher
Trans Tech Publications, Ltd.
Subject
Condensed Matter Physics,General Materials Science,Atomic and Molecular Physics, and Optics
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