Study of Oxygen Concentration in TMAH Solution for Improvement of Sigma-Shaped Wet Etching Process
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Published:2016-09
Issue:
Volume:255
Page:18-21
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ISSN:1662-9779
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Container-title:Solid State Phenomena
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language:
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Short-container-title:SSP
Author:
He Yong Gen1,
Liu Huan Xin1,
Liu Jia Lei1,
Wu Jin Gang1,
Haigermoser Christian2,
Liu Feng2,
Zhou Mei Sheng2,
Lu Wei2
Affiliation:
1. Semiconductor Manufacturing International Corporation
2. Lam Research (Shanghai) Corporation
Abstract
Tetramethylammonium hydroxide (TMAH) is a common etchant for Sigma shape formation in IC manufacturing. The impact of oxygen dissolved in TMAH solution on process was studied in this paper. A novel O2 gas injector was developed to improve the process stabilization by control of the oxygen concentration in TMAH solution
Publisher
Trans Tech Publications, Ltd.
Subject
Condensed Matter Physics,General Materials Science,Atomic and Molecular Physics, and Optics
Cited by
2 articles.
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