Abstract
The defectivity of a batch process for polymer removal in AlCu BEOL technology has been investigated, reasearching the defectivity source and studying the composition of the defects. Different solutions for the minimization of this defectivity have been found, working on the positioning of the wafers or additional cleanings. The complete eradication of the defectivity has also been demonstrated performing the process on a single wafer tool.
Publisher
Trans Tech Publications, Ltd.
Subject
Condensed Matter Physics,General Materials Science,Atomic and Molecular Physics, and Optics