Demonstration of SiC-MOSFET Embedding Schottky Barrier Diode for Inactivation of Parasitic Body Diode

Author:

Hino Shiro1,Hatta Hideyuki1,Sadamatsu Koji1,Nagahisa Yuichi1,Yamamoto Shigehisa1,Iwamatsu Toshiaki1,Yamamoto Yasuki1,Imaizumi Masayuki1,Nakata Shuhei1,Yamakawa Satoshi1

Affiliation:

1. Mitsubishi Electric Corporation

Abstract

External Schottky barrier diodes (SBD) are generally used to suppress the conduction of the body diode of MOSFET. A large external SBD is required for a high voltage module because of its high specific resistance, while the forward voltage of SBD should be kept smaller than the built-in potential of the body diode. Embedding SBD into MOSFET with short cycle length increases maximum source-drain voltage where body diode remains inactive, resulting in high current density of SBD current. We propose a MOSFET structure where an SBD is embedded into each unit cell and an additional doping is applied, which allows high current density in reverse operation without any activation of body diode. The proposed MOSFET was successfully fabricated and much higher reverse current density was demonstrated compared to the external SBD. We can expect to reduce total chip size of high voltage modules using the proposed MOSFET embedding SBD.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

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