Basal Plane Dislocations Created in 4H-SiC Epitaxy by Implantation and Activation Anneal

Author:

Stahlbush Robert E.1,Mahadik Nadeemullah A.1,Zhang Q. Jon2,Burk Albert A.2,Hull Brett A.2,Young Jonathan2

Affiliation:

1. U.S. Naval Research Laboratory

2. Cree, Inc.

Abstract

Basal plane dislocations (BPDs) introduced into SiC epitaxial layers, 25 μm thick, by the combination of implantation and activation anneal are directly observed by ultraviolet photoluminescence (UVPL) imaging. BPD loops appear to originate at micron-sized or smaller areas at the surface. These loops expand by gliding along the basal plane in the offcut direction until the loops approach the substrate. The loops can glide perpendicular to the offcut direction by many millimeters.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

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