Effect of Anisotropy on Chemical Mechanical Polishing of LBO Crystal

Author:

Li Jun1,Zhu Yong Wei1,Zuo Dun Wen1,Zhu Yong2,Chen Chuang Tian2

Affiliation:

1. Nanjing University of Aeronautics and Astronautics

2. Beijing Center for Crystal R & D

Abstract

The anisotropy of LBO crystal leads to the different properties of different crystal faces, such as thermal expansion coefficient, which results in trouble of ultra-precision machining. Chemical mechanical polishing of a face (001), b face (010) and c face (001) of LBO crystal by adopting Logitech PM5 Precision Lapping & Polishing Machine in the same process conditions was investigated. The effect of anisotropy on MRR and surface roughness was studied. In the same CMP process conditions, c face of LBO crystal is the highest MRR, b face is inferior to and a face is the lowest. And surface roughness of c face is the best, b face is followed and a face is the worst. The results also show that the anisotropy leads to the different MRR and surface roughness on different crystal faces. In CMP of LBO crystal, the higher MRR is, and the better surface roughness is in the scope of experiment.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Influence of acid slurries on surface quality of LBO crystal in fixed abrasive CMP;The International Journal of Advanced Manufacturing Technology;2014-12-07

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