Influence of acid slurries on surface quality of LBO crystal in fixed abrasive CMP

Author:

Li Jun,Wang Wenze,Wang Huimin,Song Longlong,Hu Zhanggui,Zhu Yongwei,Zuo Dunwen

Publisher

Springer Science and Business Media LLC

Subject

Industrial and Manufacturing Engineering,Computer Science Applications,Mechanical Engineering,Software,Control and Systems Engineering

Cited by 14 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Advance Chemical Mechanical Polishing Technique for Gallium Nitride Substrate;Advanced Materials Interfaces;2024-03-04

2. Atomic and close-to-atomic scale polishing of Lu2O3 by plasma-assisted etching;International Journal of Mechanical Sciences;2023-08

3. Research on chemical mechanical polishing of KTiOPO4crystal;2022 8th International Conference on Nanomanufacturing & 4th AET Symposium on ACSM and Digital Manufacturing (Nanoman-AETS);2022-08-30

4. Machining Stability Research of Soft-Brittle Crystals Lapping by Fixed-Abrasive Pad;Integrated Ferroelectrics;2022-07-28

5. Modeling and Experimental Verification of Surface Roughness for Grinding Monocrystalline Silicon Lens;Advanced Theory and Simulations;2022-04-04

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