Abstract
A light-emitting, two-dimensional photonic crystal composed of silicon-rich silicon-dioxide thin film was fabricated by using radio-frequency magnetron sputtering, simple interference exposure, and plasma etching. An enhanced photoluminescence spectrum was observed from the photonic crystal. We found that the photoluminescence peak was located around a wavelength of 830 nm and that the peak intensity was 1.5 times stronger than that from a silicon-rich silicon-dioxide thin film without a periodic structure.
Publisher
Trans Tech Publications, Ltd.
Subject
Mechanical Engineering,Mechanics of Materials,General Materials Science
Cited by
1 articles.
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