Direct Analysis of Ultra Trace Metallic Particles in NH3 and HCl Gases by Gas Exchange Device (GED)-ICP-MS
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Published:2021-02
Issue:
Volume:314
Page:17-22
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ISSN:1662-9779
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Container-title:Solid State Phenomena
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language:
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Short-container-title:SSP
Author:
Kawabata Katsu1,
Nishiguchi Kohei2,
Ichinose Tatsu1
Affiliation:
1. IAS Inc.
2. Kyoto University
Abstract
Gas Exchange Device (GED) was integrated with Inductively Coupled Plasma Mass Spectrometry(ICP-MS) for analysis of metallic particles in NH3 and HCl gases used in semiconductormanufacturing. A single pg/kg (ppq) level of metallic impurities in these gases could be determinedwithout any sample preparation.
Publisher
Trans Tech Publications, Ltd.
Subject
Condensed Matter Physics,General Materials Science,Atomic and Molecular Physics, and Optics
Cited by
1 articles.
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