Early Stage of Solid State Interfacial Reaction between Copper and Tin

Author:

Maeda Masakatsu1,Inoue Naoto1,Sato Takaaki1,Takahashi Yasuo1

Affiliation:

1. Osaka University

Abstract

High-purity plates of Cu and Sn were diffusion bonded to clarify the early stage of the solid state interfacial reaction between Cu and Sn, focusing on the incubation time for the formation of intermetallic compounds. A clear incubation time for the formation of intermetallic compounds is observed at every temperature between 423 and 493 K. The incubation time changes depending on the annealing temperature. The interface annealed at 423 K for 3.60 ks maintains the direct interconnection between Cu and Sn being free of intermetallic compounds. The exposure of Cu surface to air affects the interfacial reaction. Annealing of the Cu/Sn interface at 493 K for 3600 s starts to form voids by using the Cu plates exposed for 8.64×104 s or longer to air. Furthermore, the reaction product layer formed by the same annealing condition becomes thinner when the Cu plates exposed for 8.64×105 s or longer to air are used.

Publisher

Trans Tech Publications, Ltd.

Subject

Condensed Matter Physics,General Materials Science,Radiation

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