Affiliation:
1. Guilin University of Technology
2. Central South University
Abstract
Fluorinated diamond-like carbon (F-DLC) thin films are deposited using radio frequency plasma enhanced chemical vapor deposition under various gas flow ratios. The surface morphology of the F-DLC thin films deposited at lower gas flow ratios is a compact and uniform structure, and it became rough with the increase of gas flow ratios. The relative atomic contents of fluorine and chemical bonding configurations of C-Fx (x=1, 2, 3) in the thin films increases with the increase of gas flow ratios. The optical band gap of the thin films presents a decrease of different degree with the increase of gas flow ratios.
Publisher
Trans Tech Publications, Ltd.
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference11 articles.
1. K. Endo and T. Tatsumi: Appl. Phys. Lett. Vol. 68 (1996), p.2864.
2. ZY. Wu, YT. Yang and J.Y. Wang: Diam. Relat. Mater. Vol. 17 (2008), p.118.
3. F.R. Marciano, D.A. Lima-Oliveira, N.S. Da-Silva, E.J. Corat and V.J. Trava-Airoldi: Surf. Coat. Technol. Vol. 25 (2010), p.2986.
4. M.F. Jiang and Z.Y. Ning: Acta Phys. Sin-Ch. Ed. Vol. 53 (2004), p.1588.
5. J.W. Yi, Y.H. Lee and B. Farouk: Thin Solid Films. Vol. 423 (2003), p.97.
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