Author:
Yi Jeong W,Lee Young H,Farouk Bakhtier
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference16 articles.
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2. Fluorinated amorphous carbon thin films grown by plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics
3. Fluorinated amorphous carbon thin films grown by helicon plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics
4. Changes in structure and nature of defects by annealing of fluorinated amorphous carbon thin films with low dielectric constant
5. Novel Low k Dielectrics Based on Diamondlike Carbon Materials
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