Comparison between the Piezoresistive Properties of a-SiC Films Obtained by PECVD and Magnetron Sputtering-Reference-Cited by-同舟云学术

Comparison between the Piezoresistive Properties of a-SiC Films Obtained by PECVD and Magnetron Sputtering

Published:2011-03 Issue: Volume:679-680 Page:217-220
ISSN:1662-9752
Container-title:Materials Science Forum
language:
Short-container-title:MSF

Author:

Fraga Mariana A.¹

Affiliation:

1. Technological Institute of Aeronautics ITA – CTA

Abstract

This work compares the piezoresistive properties of SiC thin films produced by two techniques enhanced by plasma, PECVD (plasma enhanced chemical vapor deposition) and RF magnetron sputtering. In order to study these properties, strain gauges based on SiC films produced were fabricated using photolithography techniques in conjunction with lift-off processes. The beam-bending method was used to characterize the SiC strain gauges fabricated.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Link

https://www.scientific.net/MSF.679-680.217.pdf

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