SiC Epi-Channel Lateral MOSFETs

Author:

Yen Cheng Tyng1,Bakowski Mietek2,Hung Chien Chung1,Reshanov Sergey A.2,Schöner Adolf2,Lee Chwan Ying1,Lee Lurng Shehng1,Wei Jeng Hua1,Chiu Ting Yu1,Huang Chih Fang1

Affiliation:

1. Industrial Technology Research Institute

2. Acreo AB

Abstract

SiC lateral MOSFETs with multi-layers epi-channels were studied in this work. The epi-channel with a high concentration n-type epilayer sandwiched by two lightly doped p-type layers showed a maximum field effect mobility of 17 cm2/V.s, improved from 1.53 cm2/V.s of devices without epi-channels. These devices are normally-off with an average threshold voltage of 1.34V.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

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