Low-Temperature Atomic Layer Deposition of AlN Using Trimethyl Aluminum and Plasma Excited Ar Diluted Ammonia
Author:
Affiliation:
1. Yamagata University
Publisher
Institute of Electronics, Information and Communications Engineers (IEICE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Link
https://www.jstage.jst.go.jp/article/transele/E105.C/10/E105.C_2021FUP0001/_pdf
Reference22 articles.
1. [1] A. Khan, K. Balakrishnan, and T. Katona, “Ultraviolet light-emitting diodes based on group three nitrides,” Nature Photonics, vol.2, no.2, pp.77-84, 2008. 10.1038/nphoton.2007.293
2. [2] S. Strite, M.E. Lin, and H. Morkoç, “Progress and prospects for GaN and the III-V nitride semiconductors,” Thin. Solid. Films., vol.231, no.1-2, pp.197-210, 1993. 10.1016/0040-6090(93)90713-y
3. [3] A.R. Cho, E.H. Kim, S.Y. Park, and L.S. Park,” Flexible OLED encapsulated with gas barrier film and adhesive gasket,” Synthetic. Met., vol.193, pp.77-80, 2014. 10.1016/j.synthmet.2014.03.027
4. [4] M. Usman, A. Hallén, T. Pilvi, A. Schöner, and M. Leskeläb,“Toward the Understanding of Stacked Al-Based High-k Dielectrics for Passivation of 4H-SiC Devices,” J. Electrochem. Soc., vol.158, no.1, pp.H75-79, 2011. 10.1149/1.3517137
5. [5] K.J. Chen and S. Huang, “AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers,” Semicond. Sci. Tech., vol.28, no.7, p.074015, 2013. 10.1088/0268-1242/28/7/074015
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1. Moisture barrier coating of AlN and Al2O3 multilayer film prepared by low-temperature atomic layer deposition;Journal of Vacuum Science & Technology A;2022-12
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