Effect of Nitrogen-Doped LaB6 Interfacial Layer on Device Characteristics of Pentacene-Based OFET
Author:
Affiliation:
1. Tokyo Institute of Technology
2. New Industry Creation Hatchery Center, Tohoku University
Publisher
Institute of Electronics, Information and Communications Engineers (IEICE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Link
https://www.jstage.jst.go.jp/article/transele/E100.C/5/E100.C_463/_pdf
Reference28 articles.
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