Si-based Ka-band SIW band-pass filter using wafer level manufacturing process-Reference-Cited by-同舟云学术

Si-based Ka-band SIW band-pass filter using wafer level manufacturing process

Published:2021-01-10 Issue:1 Volume:18 Page:20200414-20200414
ISSN:1349-2543
Container-title:IEICE Electronics Express
language:en
Short-container-title:IEICE Electron. Express

Author:

Zhu Hanxiang¹²,Li Jun¹³,Cao Liqiang¹³,Cao Jia⁴,Chen Pengwei⁴

Affiliation:

1. System Packaging and Integration Technology Center, Institute of Microelectronics of the Chinese Academy of Sciences

2. School of Electronic, Electrical and Communication Engineering, University of Chinese Academy of Sciences

3. National Center for Advanced Packaging

4. Beijing Institute of Radio Measurement

Publisher

Institute of Electronics, Information and Communications Engineers (IEICE)

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

https://www.jstage.jst.go.jp/article/elex/18/1/18_17.20200414/_pdf

Reference30 articles.

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