1. Bir, G. L. & Pikus, G. E. (1974). Symmetry and strain-induced effects in semiconductors. New York: Wiley (in Russian).
2. Tensoresistance as an information source on mobility anisotropy parameter K = μ=/μ|| in multivalley semiconductors and certain new possibilities of deformation metrology;Gaidar;Surf Eng Appl Electrochem 51 No 2 pp 188-195 https,2015
3. Budzuliak, S. I. (2012). Tensoresistive effects in strongly deformed n-Si and n-Ge crystals. Physics and Chemistry of Solid State, 13, No. 1, pp. 34-39 (in Ukrainian). http: //page. if. ua/uploads/pcss/vol13/! 1301-05. pdf
4. On methodology of measuring parameters with the increased sensitivity to residual or irradiation induced inhomogeneities in semiconductors;Gaidar;Semicond Phys Quantum Electron Optoelectron 12 No 4 pp 324-327 http,2009
5. Gorin, A. E., Gromova, G. V., Ermakov, V. M., Kogoutyuk, P. P., Kolomoets, V. V., Nasarchuk, P. F., Panasjuk, L. I. & Fedosov, S. A. (2011). Silicon p-MOS and n-MOS transistors with uniaxially strained channels in electronic device nanotechnology. Ukr. J. Phys., 56, No. 9, pp. 917-921. http: //archive. ujp. bitp. kiev. ua/files/journals/56/9/560907p. pdf