High quality AlN with uniform in-plane strain on nano-patterned AlN templates achieved by preset strain modulation

Author:

Liu Baiyin,Xu FujunORCID,Wang Jiaming,Lang Jing,Zhang Na,Fang Xuzhou,Wang Liubing,Yang XuelinORCID,Kang Xiangning,Wang Xinqiang,Qin Zhixin,Ge Weikun,Shen Bo

Abstract

Abstract High-quality AlN with uniform in-plane strain has been attempted with preset strain modulation on nano-patterned AlN templates (NPATs). It is found that this strain preset frame can effectively improve both the tilt and twist features of AlN on NPATs, further greatly decreasing threading dislocation density. More importantly, the AlN epilayer after completing coalescence can maintain the in-plane uniform compressive strain. Adopting AlN templates achieved in this scheme, the chip-on-wafer light output power (LOP) of AlGaN light-emitting diode (LED) reaches 10.2 mW at 100 mA with single emission peak at 280 nm, which increases by 22.3% than the LOP of LED device without adopting this strain preset frame.

Funder

the National Key Research and Development Program of China

National Natural Science Foundation of China

the Key-Area Research and Development Program of Guangdong Province

Major Scientific and Technological Innovation Project (MSTIP) of Shandong Province

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

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