MOSFET series resistance extraction at cryogenic temperatures

Author:

Takeuchi KiyoshiORCID,Mizutani TomokoORCID,Saraya TakuyaORCID,Oka HiroshiORCID,Mori TakahiroORCID,Kobayashi MasaharuORCID,Hiramoto ToshiroORCID

Abstract

Abstract A series resistance extraction method proposed recently, which uses multiple drain current versus gate voltage curves at varied drain voltages, was applied to bulk CMOS devices at low temperatures down to 4 K. A moderate reduction of series resistance compared with 300 K was found. Horizontal field dependence of mobility significantly changed with temperature, which was taken into account during the extraction. Anomalous non-linear series resistance was observed at 4 K only for p-channel FETs, suggesting the need for careful source/drain overlap design for low temperature operations.

Publisher

IOP Publishing

Subject

General Physics and Astronomy,General Engineering

Reference32 articles.

Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. TCAD analysis of conditions for DIBL parameter misestimation in cryogenic MOSFETs;Japanese Journal of Applied Physics;2024-09-02

2. Variability of MOSFET Series Resistance Extracted from Individual Devices: Is Direct Variability Measurement Possible?;2023 35th International Conference on Microelectronic Test Structure (ICMTS);2023-03-27

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