Importance of crystallinity improvement in MoS2 film by compound sputtering even followed by post sulfurization-Reference-Cited by-同舟云学术

Importance of crystallinity improvement in MoS2 film by compound sputtering even followed by post sulfurization

Published:2021-02-03 Issue:SB Volume:60 Page:SBBH10
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Imai Shinya,Hamada Takuya,Hamada Masaya^ORCID,Shirokura Takanori^ORCID,Muneta Iriya,Kakushima Kuniyuki,Tatsumi Tetsuya,Tomiya Shigetaka,Tsutsui Kazuo,Wakabayashi Hitoshi

Abstract

Abstract The MoS2 film for chip-size area was synthesized by two step processes consisting of MoS2-compound sputtering and post sulfurization. We intentionally revealed that the crystallinity of sulfurized MoS2 film depends on that of just-after-sputtered film. Therefore, a crystallinity improvement just-after sputtering is mandatory to achieve an excellent quality MoS2 film after sulfur-vapor annealing for thin film transistor, sensor and human interface device applications.

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

https://iopscience.iop.org/article/10.35848/1347-4065/abdcae/pdf

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