Abstract
Abstract
We performed the first-principles calculations for a nitrogen vacancy (V
N) and hydrogen(H) atom in β-Si3N4 to clarify the atomistic origin of charge traps in silicon nitride (SiN) layers and charge-trapping mechanism used for 3D NAND flash memories. The present calculations showed that V
N attracted H impurities and the structures where one Si dangling bond on V
N is terminated by an H atom and the remaining two Si atoms form Si–Si bond (V
N-H complexes) were formed in SiN layers. We investigated the electronic behavior of V
N-H complexes and found that V
N-H complexes act as charge traps. From our results, the atomistic origin of charge traps in SiN layers seems to be V
N-H complexes.
Subject
General Physics and Astronomy,General Engineering