Author:
Machida Satoru,Yamashita Yusuke,Saito Jun,Senoo Masaru
Abstract
Abstract
This paper reports on the newly developed silicon insulated gate bipolar transistor (IGBT) for Toyota’s fifth generation power devices. The designed IGBTs with a grid-patterned trench provide a lower on-state voltage (V
ON
) while maintaining a wide mesa width. A successful 15% reduction of V
ON
was accomplished by enhancement of the two-dimensional hole storage effect. Furthermore, the grid-patterned trench IGBT merged with Schottky and multi-layered anode technology demonstrated a significant improvement in the trade-off curve between the reverse recovery current (I
rr
) and V
ON
in a reverse conducting IGBT without a lifetime control process. As a result, the grid-patterned trench IGBT has contributed to reduce power loss and volume in the new power control units.
Subject
General Physics and Astronomy,General Engineering