Electrical properties of oxygen precipitate-related defects in Czochralski silicon

Abstract

Abstract Oxygen precipitate-related defects in Czochralski (Cz) silicon have been studied by electron-beam-induced current (EBIC) and deep-level transient spectroscopy (DLTS). The EBIC results present that oxygen precipitates combined with dislocations can strengthen carrier recombination. The DLTS data reveals two levels of T 1 (E v + 0.43 eV) and T 2 (E v + 0.26 eV), which are related to the oxygen precipitates and dislocations, respectively. Hydrogen can partly passivate the recombination activity of oxygen precipitates and dislocations, as well as their induced electronic states. The results are of interest for deeply understanding the electronic properties of oxygen precipitates and their induced dislocations in Cz silicon used in the semiconductor industry.