Abstract
Abstract
Semiconductor nano-membranes provide a new way to develop optical devices with better performance. Herein, we report a fabrication method of GaN-based LED membranes with a complete device structure including contact metals from Si substrate by using electrochemical etching of highly conductive AlN/Si interface, which is often naturally formed in GaN-on-Si materials. Photoluminescence and Raman scattering spectra show that the internal stress after the lift-off was effectively lightened with 1.45 GPa. Electrical measurement results show that both the leakage current and series resistance were largely decreased, and strong and uniform electroluminescence further proved the well-preserved whole structure.
Funder
the Key R&D Program of Jiangsu Province
the Suzhou Science and Technology Program
the National Key R&D Program of China
the Guangdong Province Key-Area R&D Program
the Strategic Priority Research Program of CAS
the Jiangxi Double Thousand Plan
the Jiangxi Science and Technology Program
the Bureau of International Cooperation, CAS
the Natural Science Foundation of China
the Key Research Program of Frontier Sciences, CAS
Subject
General Physics and Astronomy,General Engineering
Cited by
7 articles.
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